Nikon LU Plan ELWD 20x Brightfield Darkfield Objective SZX7 SZX9 SZX10 The apochromatic design corrects chromatic

The apochromatic design corrects chromatic aberration across three wavelengths and spherical aberration across two

single-molecule imaging

and advanced illumination to support surgical workflows that require consistent high-quality visualization

and offers UV transmission at 365nm

Specification Details Set Components BH2-PC turret condenser + 10x

Nikon LU Plan ELWD 20x Brightfield Darkfield Objective SZX7 SZX9 SZX10 The apochromatic design corrects chromaticVersatile 20 industrial objective with exceptional 13mm working distance for brightfield and darkfield reflected light microscopy of opaque materials. 20 Magnification, 0. 40 NA Ideal balance of field of view and resolution for general purpose industrial microscopy. 13mm Extra Long Working Distance Exceptional clearance accommodates thick specimens, fixtures, and challenging sample geometries. Brightfield & Darkfield Capable Dual mode illumination