Nikon TU Plan ELWD 50x Brightfield Darkfield Objective UMPLFLN20XW and detection of subsurface defects

and detection of subsurface defects that are invisible in visible light

manufactured in Japan

Achieve versatile multi-mode imaging with extended working distance for water immersion microscopy

Once positioned

2 rotatable Filter Size 32mm Rotatable Positions 2 (allow in-path angular adjustment of installed element) Country of Origin Japan HS Code 901190 Condition New / OEM Universities and research institutions are welcome to purchase using an official purchase order

Nikon TU Plan ELWD 50x Brightfield Darkfield Objective UMPLFLN20XW and detection of subsurface defectsNikon TU Plan ELWD 50x 0. 60 EPI D Objective Extra Long Working Distance Exceptional 11mm working distance ideal for thick specimens and inspection tasks Dual mode capability: brightfield and darkfield (EPI D) illumination Infinity corrected optics for modern Nikon industrial microscope systems Optics are flawless. Light signs of use on outer metal barrel save 52% vs. new list price of $4,995 Product Description The Nikon TU Plan ELWD 50x 0. 60 EPI D