Olympus IX Inverted Reflected Light Industrial Microscope - DIC, BF, Pol LEICA ERGO LEICA this objective delivers exceptional resolution

this objective delivers exceptional resolution and detail for demanding materials analysis

and environmental chambers without risk of contact with the specimen or vessel

and GX51/71 inverted metallurgical systems

🧠 CFI Plan Achromat Optical Design — Minimizes chromatic and spherical aberrations for uniform clarity

🔩 C-Mount standard — compatible with a wide range of scientific and industrial cameras

Olympus IX Inverted Reflected Light Industrial Microscope - DIC, BF, Pol LEICA ERGO LEICA this objective delivers exceptional resolutionThe Olympus IX Inverted Metallurgical Microscope is a fully configured, reconditioned industrial reflected light system equipped with a complete set of UMPlanFL objectives, DIC Nomarski contrast, polarized light, and a 1x C mount camera port a turnkey solution for materials characterization, failure analysis, and semiconductor inspection. 5 objective UMPlanFL set 5x, 10x, 20x, 50x, and 100x infinity corrected reflected light objectives DIC Nomarski